@misc{Nossarzewska-Orłowska_Elżbieta_Epitaksja_1995,
 author={Nossarzewska-Orłowska Elżbieta},
 volume={23},
 editor={Lipiński Dariusz},
 editor={Pawłowska Marta},
 editor={Brzozowski Andrzej},
 number={3},
 copyright={Rights Reserved - Free Access},
 address={Warszawa},
 journal={Electronic Materials},
 howpublished={online},
 year={1995},
 publisher={ITME},
 language={pol},
 type={Text},
 title={Epitaksja krzemu na krzemie porowatym = Silicon epitaxy over porous silicon},
 URL={http://rcin.org.pl/Content/14781/PDF/WA901_14691_M1_r1995-t23-z3_Mater-Elektroniczne_Nossarzewska_i.pdf},
 keywords={Electronic - materials, Electronic - journal - materials, silicon epitaxy, porous silicon, CVD},
}