@misc{Tomaszewski_Henryk_Effect_1996,
 author={Tomaszewski Henryk},
 volume={24},
 editor={Haemers Johan},
 editor={De Roo Nico},
 editor={De Gryse Roger},
 number={2/3},
 copyright={Rights Reserved - Free Access},
 address={Warszawa},
 journal={Electronic Materials},
 howpublished={online},
 year={1996},
 publisher={ITME},
 language={eng},
 type={Text},
 title={Effect of RF magnetron sputtering conditions on microstructure and X-ray characteristics of yttria-stabilized zirconia thin films = Wpływ warunków sputeringu magnetronowego na mikrostrukturę i charakterystykę rentgenowską cienkich warstw dwutlenku cyrkonu stabilizowanego tlenkiem itru},
 URL={http://rcin.org.pl/Content/15346/PDF/WA901_14925_M1_r1996-t24-z2-3_Mater-Elektroniczne_Tomaszewski_i.pdf},
 keywords={Electronic - materials, Electronic - journal - materials, magnetron sputtering, YSZ, XRD},
}