@misc{Jaskólska_Halina_Zdejmowanie_1976,
 author={Jaskólska Halina},
 volume={15},
 number={3},
 editor={Waliś Lech},
 editor={Gołkowska Anna},
 copyright={Rights Reserved - Free Access},
 address={Warszawa},
 journal={Electronic Materials},
 howpublished={online},
 year={1976},
 publisher={Wydaw. Przemysłu Maszynowego WEMA},
 language={pol},
 type={Text},
 title={Zdejmowanie cienkich warstw z płytek krzemowych metodą utleniania anodowego i rozpuszczania utworzonego tlenku = Removal of thin layers from silicon wafersby means of an anodic oxidation and dissolution of the oxides formed},
 URL={http://rcin.org.pl/Content/20308/PDF/WA901_10866_M1_r1976-z3-15_Mater-Elektron-Jask_i.pdf},
 keywords={Electronic - journal - materials, Electronic - materials, removal of thin layers, Si, anodic oxidation, dissolution of oxide},
}