@misc{Skrzynecka_Irena_Badanie_1975,
 author={Skrzynecka Irena},
 volume={9},
 number={1},
 copyright={Rights Reserved - Free Access},
 journal={Electronic Materials},
 address={Warszawa},
 howpublished={online},
 year={1975},
 publisher={Wydaw. Przemysłu Maszynowego "WEMA"},
 language={pol},
 title={Badanie maskowania procesu termicznego utleniania krzemu przez chemicznie osadzane warstwy azotku krzemu = Masking investigation of silicon thermal oxidation process by chemically deposited Si3N4 films},
 type={Text},
 URL={http://rcin.org.pl/itme/Content/19784/PDF/WA901_10586_M1_r1975-z1-9_Mater-Elektron-Skrzy_i.pdf},
 keywords={Electronic - materials, Electronic - journal - materials, thermal oxidation, Si, CVD, Si3N5},
}