Title:

Otrzymywanie warstw SiCN metoda RF sputteringu = SiCN films deposited by RF magnetron sputtering

Subtitle:

Materiały Elektroniczne 2011 T.39 nr 2

Creator:

Stańczyk Beata

Publisher:

ITME

Place of publishing:

Warszawa

Date issued/created:

2011

Description:

Bibliogr. s. 23 ; 18-23 s. : il. 30 cm.

Subject and Keywords:

Electronic - journal - materials ; Electronic - materials ; RF sputtering ; SiCN ; absorption spectrum ; IR spectrum ; x-ray diffraction ; SIMS

Relation:

Electronic Materials

Volume:

39

Issue:

2

Start page:

18

End page:

23

Resource type:

Text

Detailed Resource Type:

Article

Format:

application/pdf

Source:

ITME, sygn. dostępny ; click here to follow the link

Language:

pol

Rights:

Rights Reserved - Free Access

Terms of use:

Copyright-protected material. May be used within the limits of statutory user freedoms

Digitizing institution:

Institute of Electronic Materials Technology

Original in:

Library of the Electronic Materials Technology Institute

Projects co-financed by:

Programme Innovative Economy, 2010-2014, Priority Axis 2. R&D infrastructure ; European Union. European Regional Development Fund

Access:

Open